Design for Manufacturability with Advanced Lithography | EKB DL

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Design for Manufacturability with Advanced Lithography

Design for Manufacturability with Advanced Lithography

Description

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

Keywords

Technology & EngineeringElectronicsCircuitsComputersComputer ArchitectureElectrical

2015Book

Author(s)Bei Yu, David Z. Pan

PublisherSpringer International Publishing

ISBN9783319203843

LanguageEnglish

SpringerLink Book

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