Gate Dielectrics and MOS ULSIs: Principles, Technologies and Applications (Springer Series in Electronics and Photonics) | EKB DL

EKB DL

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Gate Dielectrics and MOS ULSIs: Principles, Technologies and Applications (Springer Series in Electronics and Photonics)

Description

Gate Dielectrics focusses on dielectric films satisfying the superior quality gate dielectric even in large-scale integration. The information presented is rather up to date with regard to nanometer-range ultrathin gate-dielectric films, which are indispensible for submicrometer ULSIs.